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Anguang Enterprise Group has long been engaged in the R&D and production of photoresists and developers. It meticulously develops high-quality electronic materials to empower the high-quality development of the semiconductor industry.
Anguang Enterprise Group has long been engaged in the R&D and production of photoresists and developers. It meticulously develops high-quality electronic materials to empower the high-quality development of the semiconductor industry.
Positive and negative photoresists are key materials commonly used in semiconductor manufacturing and play a vital role in the lithography process. This article elaborates on the differences, characteristics, and applications of positive and negative photoresists in semiconductor manufacturing.
Positive and negative photoresists are key materials commonly used in semiconductor manufacturing and play a vital role in the lithography process. This article elaborates on the differences, characteristics, and applications of positive and negative photoresists in semiconductor manufacturing.
# I. Differences and Characteristics
## 1. Characteristics of Positive Photoresist
A positive photoresist is a photosensitive material. Its feature is that after exposure to ultraviolet light, the exposed part becomes more soluble, enabling pattern formation.
It is suitable for fabricating regions that need to be retained in the pattern, meaning the irradiated part remains after exposure.
Common positive photoresists include the AZ series photoresists and others.
## 2. Characteristics of Negative Photoresist
After a negative photoresist is exposed to ultraviolet light, a cross-linking reaction occurs in the exposed area, making this part insoluble, while the unexposed part can be removed.
It is suitable for fabricating regions that need to be removed, meaning the irradiated part is stripped off after exposure.
Common negative photoresists include SU-8 and other types.
